Scrutica
Capacity, hardware inventory, ownership chain, and supply-chain position for ASML Veldhoven (EUV Manufacturing HQ). Any export-control exposure is walked through the canonical organization graph — surfacing when the BIS Entity List touches a node above the facility in the chain — rather than asserted at the facility row.
As of 2026-07-27
Operator (or owner of record) per the Scrutica facility row.
1 record
Every organization on record at ASML Veldhoven (EUV Manufacturing HQ), with the role it plays and the source for that specific claim. A party marked inferred is recorded as a reading of the cited source rather than something the source states outright.
Source: Company Press Releases · Tier 2
ASML, the documented owner of ASML Veldhoven (EUV Manufacturing HQ), sits as a seed node in 3 pre-built cascade scenarios. Severity and decay are scenario parameters (editorial), not measured values: severity is the scenario's seed-impact value (per-node override where one is defined); decay reflects the curator's substitutability assessment for the disrupted role. Run any scenario to walk the propagation through the full supply-chain graph.
EUV lithography is irreplaceable — no alternative supplier exists at any node ≤7nm, so impact propagates almost fully downstream.
Description
ASML headquarters and primary EUV lithography system manufacturing, assembly, and testing facility. Every EUV scanner shipped globally originates here.
Notes
Sole global source of EUV lithography equipment. Critical supply chain chokepoint.
Other Facilities in NL
Chain walk halted at a cyclic affiliate relation; further ancestors require manual structural review.
Netherlands (NL)
Operates the EU dual-use framework plus discrete national export rules on advanced semiconductor manufacturing equipment (DUV/EUV) introduced in 2023.
Regimes: Wassenaar Arrangement; EU Dual-Use Regulation 2021/821; Dutch national semiconductor-equipment rules
Established via: ASML
No flags found across the chain (BIS Entity List, designation-cascade closures, or compute-threshold reporting obligations) as of 2026-07-27. Cascade closures evaluated: 0.
No ownership-change events documented in the available data for any entity in this chain over the last 5 years. Events draw from a licensed corporate-ownership database’s deal records (M&A, buyout, divestiture, asset sale, JV formation); coverage is strongest for private US/EU transactions and partial for state-owned-enterprise restructurings or non-Western private deals. Subsequent ingestion runs may add events here.
No documented sovereign or state-linked LP investment touches any entity in this chain. The licensed database’s LP disclosure is partial — an empty list here is a coverage limit, not a finding.
The walk for ASML Veldhoven (EUV Manufacturing HQ)starts at the operator org id (or owner org id when no operator is recorded) and climbs upward through the unified affiliate graph, normalized to trace child-to-parent relationships. At each hop, the highest-authority parent edge wins (priority ordering: SEC EDGAR / 10-K / LEI registry > licensed corporate-ownership database > licensed supply-chain database > BIS / Federal Register > licensed affiliate graph). Confidence and recency break ties.
The walk terminates on (a) a node with a public-filing-grade ancestor edge — a SEC filer, an LEI-registered listed entity, or a 10-K-disclosed parent — (b) a government entity, (c) a 10-hop limit, or (d) a detected cycle. When termination is not at a public filer or government, the panel labels the chain's end-state as opaque beyond that point. Opacity is reported, never implied.
Per-source confidence (licensed corporate-ownership database): HIGH for Parent / Subsidiary edges; MEDIUM for JV and AFFILIATE edges. Known limitations: (1) shell companies with undisclosed principals terminate the public-record walk; (2) recent transactions reach the panel after the database's weekly refresh; (3) cross-jurisdiction private holding structures may carry intermediate hops that are not in any ingested source. Each row carries an edge-level as of date so freshness is auditable per hop.
Two further caveats are inherent to how the walker and the underlying data compose. The walker selects a single highest-authority parent per hop, so JV or multi-parent ownership structures collapse to one displayed path; alternate parents exist in the ingested sources but are not surfaced on this card. And some licensed-database edges encode parent-of relations against entity-resolved stub IDs whose display name reflects a sub-entity (a business unit, an acquired-then-renamed line) rather than the canonical parent — when a chain reads structurally surprising, the per-row source citation is the authoritative reference, not the chain's narrative shape.
Computed at: 2026-07-27. Walk depth observed: 1 hop. Sources combined: Scrutica facility record + licensed corporate-ownership database + SEC CIK cross-reference + LEI registry + (where applicable) licensed supply-chain database + Federal Register designation closures. The licensed databases are held under subscription and not redistributed; per-hop labels name no vendor.
Substitutability is unchanged from the blanket asml-export-halt scenario — EUV remains zero-alternative-supplier regardless of which jurisdictions retain access; the allied-only carve-out is captured in edgeFilter, not in per-hop decay.
DUV is replaceable at mature nodes (Nikon and Canon retain ArF and KrF capacity for nodes ≥28nm), so per-hop attenuation is meaningfully greater than for EUV — but advanced-DUV ArF immersion remains effectively sole-source ASML for 7nm-class multi-patterning work.
AMS08
NL